Nitriding process for next-generation semiconductor devices...

Applied Surface Science 2020 / 03 Vol. 506

Nitriding process for next-generation semiconductor devices by VHF (162 MHz) multi-tile push-pull plasma source

Ji, You Jin, Kim, Ki Seok, Kim, Ki Hyun, Ellingboe, Albert Rogers, Yeom, Geun Young
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Volume:
506
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2019.144904
Date:
March, 2020
File:
PDF, 1.23 MB
2020
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