Degradation of phenolic compounds by dielectric barrier...

Chemical Engineering Journal 2020 / 04 Vol. 385

Degradation of phenolic compounds by dielectric barrier plasma: Process optimization and influence of phenol substituents

Wang, Jing, Li, Lei, Cao, Hongbin, Yang, Chuanfang, Guo, Zhuang, Shi, Yanchun, Li, Wangliang, Zhao, He, Sun, Jiajun, Xie, Yongbing
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Volume:
385
Journal:
Chemical Engineering Journal
DOI:
10.1016/j.cej.2019.123732
Date:
April, 2020
File:
PDF, 1.44 MB
2020
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