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Optimized hydrogen concentration within a remotely induced hollow-anode plasma for fast chemical-vapor-deposition of photosensitive and -preferential microcrystalline silicon thin-films
Tabuchi, Toshihiro, Toyoshima, Yasumasa, Fujimoto, Shinichi, Takashiri, MasayukiVolume:
694
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2019.137714
Date:
January, 2020
File:
PDF, 1.32 MB
2020