Plasma-prepared arsenic telluride films: relationship...

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Materials Research Express 2019 / 12

Plasma-prepared arsenic telluride films: relationship between physico-chemical properties on the parameters of the deposition process

Mochalov, Leonid, Logunov, Alexander, Markin, Aleksey, Kitnis, Anna, Vorotyntsev, Vladimir
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Journal:
Materials Research Express
DOI:
10.1088/2053-1591/ab62ea
Date:
December, 2019
File:
PDF, 1.04 MB
2019
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