Plasma-enhanced atomic layer deposition of hafnium silicate...

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Ceramics International 2020 / 1

Plasma-enhanced atomic layer deposition of hafnium silicate thin films using a single source precursor

Kim, Jae-Hwan, Ngoc Van, Tran Thi, Oh, Jiwon, Bae, Seung-Muk, Lee, Sang Ick, Shong, Bonggeun, Hwang, Jin-Ha
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Journal:
Ceramics International
DOI:
10.1016/j.ceramint.2020.01.002
Date:
January, 2020
File:
PDF, 3.39 MB
2020
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