Source/Drain Materials for Ge nMOS Devices

Source/Drain Materials for Ge nMOS Devices

Vohra, Anurag, Porret, Clement, Rosseel, Erik, Hikavyy, Andriy Yakovitch, Capogreco, Elena, Horiguchi, Naoto, Loo, Roger, Vandervorst, Wilfried
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Volume:
93
Journal:
ECS Transactions
DOI:
10.1149/09301.0029ecst
Date:
October, 2019
File:
PDF, 261 KB
2019
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