New Slurry Formulation for Copper-CMP Process in a...

MRS Proceedings 2002 Vol. 732

New Slurry Formulation for Copper-CMP Process in a Damascene Integration Scheme

Terzieva, Valentina L., Sijmus, Bram M., Meuris, Marc A., Puppe, Lothar, Passing, Gerd
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Volume:
732
Year:
2002
Journal:
MRS Proceedings
DOI:
10.1557/PROC-732-I3.4
File:
PDF, 185 KB
2002
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