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Effect of strains on anisotropic material transport in copper interconnect structures under electromigration stress
Roberto Lacerda de Orio, Hajdin Ceric, Siegfried SelberherrVolume:
7
Language:
english
Pages:
4
DOI:
10.1007/s10825-008-0211-9
Date:
September, 2008
File:
PDF, 308 KB
english, 2008