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Recent Developments on MOCVD of Ferroelectric Thin Films
Yohei Otani, Soichiro Okamura, Tadashi ShiosakiVolume:
13
Language:
english
Pages:
8
DOI:
10.1007/s10832-004-5069-z
Date:
July, 2004
File:
PDF, 243 KB
english, 2004