Characteristics of Ir etching using Ar/Cl2inductively...

Characteristics of Ir etching using Ar/Cl2inductively coupled plasmas

SE-GEUN PARK, CHIN-WOO KIM, HO-YOUNG SONG, HYOUN WOO KIM, JU HYUN MYUNG, SUKHO JOO, SOON OH PARK, KYU-MANN LEE
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
40
Language:
english
Pages:
2
DOI:
10.1007/s10853-005-1811-4
Date:
September, 2005
File:
PDF, 272 KB
english, 2005
Conversion to is in progress
Conversion to is failed