Application of N2/Ar inductively coupled plasma...

Journal of Materials Science 2005 / 07 Vol. 40; Iss. 13

Application of N2/Ar inductively coupled plasma → the photoresist ashing for low-kdielectrics

Hyoun Woo Kim, Ju Hyun Myung, Nam Ho Kim, Chung-Gon Yoo, Kee Won Suh, Sung Kyeong Kim, Dae-Kyu Choi, Chin-Wook Chung, Chang-Jin Kang, Wan Jae Park, Se-Geun Park, Jae-Gab Lee
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Volume:
40
Language:
english
Pages:
2
DOI:
10.1007/s10853-005-2877-8
Date:
July, 2005
File:
PDF, 240 KB
english, 2005
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