Comparison between Ni-SALICIDE and Self-Aligned Lift-Off...

Materials Science Forum 2019 / 7 Vol. 963

Comparison between Ni-SALICIDE and Self-Aligned Lift-Off Used in Fabrication of Ohmic Contacts for SiC Power MOSFET

Sledziewski, Tomasz, Erlbacher, Tobias, Bauer, Anton, Frey, Lothar, Chen, Xi Ming, Zhao, Yan Li, Li, Cheng Zhan, Dai, Xiao Ping
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Volume:
963
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/msf.963.490
Date:
July, 2019
File:
PDF, 1.09 MB
2019
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