Memory characteristics of Al2O3/LaAlO3/SiO2multilayer structures with tunnel oxide thickness variation
Seung-Yong Cha, Hyo-June Kim, Doo-Jin ChoiVolume:
45
Language:
english
Pages:
5
DOI:
10.1007/s10853-010-4562-9
Date:
October, 2010
File:
PDF, 440 KB
english, 2010