GaN reactive ion etching using SiCl4:Ar:SF6chemistry

GaN reactive ion etching using SiCl4:Ar:SF6chemistry

E. Sillero, F. Calle, M. A. Sánchez-García
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
16
Language:
english
Pages:
5
DOI:
10.1007/s10854-005-2306-4
Date:
July, 2005
File:
PDF, 840 KB
english, 2005
Conversion to is in progress
Conversion to is failed