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Effect of oxygen to argon ratio on the properties of thin SiOxfilms deposited by r.f. sputtering
J. M. Terrazas, N. Nedev, E. Manolov, B. Valdez, D. Nesheva, M. A. Curiel, R. Haasch, I. PetrovVolume:
21
Language:
english
Pages:
5
DOI:
10.1007/s10854-009-9942-z
Date:
May, 2010
File:
PDF, 446 KB
english, 2010