Kinetic study of hydrogen lateral diffusion at high...

Nanotechnology 2020 / 03 Vol. 31; Iss. 13

Kinetic study of hydrogen lateral diffusion at high temperature in a directly-bonded InP-SiO 2 /Si substrate

Besancon, C, Fournel, F, Sanchez, L, Vaissiere, N, Dupré, C, Le Goec, J-P, Muffato, V, Jany, C, Bassani, F, David, S, Baron, T, Decobert, J
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Volume:
31
Journal:
Nanotechnology
DOI:
10.1088/1361-6528/ab5ce5
Date:
March, 2020
File:
PDF, 855 KB
2020
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