Polishing Behavior of the Various Interconnect Thin Films...

Polishing Behavior of the Various Interconnect Thin Films in Cu Damascene Process with Different Slurries

Zantye, Parshuram B., Sikder, Arun K., Kumar, Ashok
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Volume:
767
Year:
2003
Journal:
MRS Proceedings
DOI:
10.1557/PROC-767-F6.9
File:
PDF, 260 KB
2003
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