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Polishing Behavior of the Various Interconnect Thin Films in Cu Damascene Process with Different Slurries
Zantye, Parshuram B., Sikder, Arun K., Kumar, AshokVolume:
767
Year:
2003
Journal:
MRS Proceedings
DOI:
10.1557/PROC-767-F6.9
File:
PDF, 260 KB
2003