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ChemInform Abstract: BEHAVIOR OF IMPURITIES DURING CHEMICAL VAPOR DEPOSITION OF GALLIUM ARSENIDE
SIDOROV, YU. G., VASIL'EVA, L. F., SABININA, I. V., DVORETSKY, S. A., SIDOROVA, A. V.Volume:
7
Journal:
Chemischer Informationsdienst
DOI:
10.1002/chin.197632003
Date:
August, 1976
File:
PDF, 124 KB
1976