A Self-Aligned Silicide Process Utilizing Ion Implants for...

MRS Proceedings 2002 Vol. 716

A Self-Aligned Silicide Process Utilizing Ion Implants for Reduced Silicon Consumption and Control of the Silicide Formation Temperature

Cohen, G. M., Cabral, C., Lavoie, C., Solomon, P. M., Guarini, K.W., Chan, K.K., Roy, R.A.
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Volume:
716
Year:
2002
Journal:
MRS Proceedings
DOI:
10.1557/PROC-716-B1.7
File:
PDF, 77 KB
2002
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