Area-selective ALD of Ru on nm-scale Cu lines through dimerization of amino-functionalized alkoxy silane passivation films.
Zyulkov, Ivan, Madhiwala, Viraj, Voronina, Ekaterina N., Snelgrove, Matthew, Bogan, Justin, O'Connor, Robert, De Gendt, Stefan, Armini, SilviaLanguage:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.9b14596
Date:
January, 2020
File:
PDF, 995 KB
english, 2020