High-Rate Deposition of Amorphous SiC Films by Atmospheric...

Journal of the Japan Society for Precision Engineering Contributed Papers 2004 Vol. 70; Iss. 8

High-Rate Deposition of Amorphous SiC Films by Atmospheric Pressure Plasma Chemical Vapor Deposition (2nd Report)

KAKIUCHI, Hiroaki, OHMI, Hiromasa, NAKAZAWA, Koichi, YASUTAKE, Kiyoshi, YOSHII, Kumayasu, MORI, Yuzo
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Volume:
70
Year:
2004
Journal:
Journal of the Japan Society for Precision Engineering, Contributed Papers
DOI:
10.2493/jspe.70.1075
File:
PDF, 706 KB
2004
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