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ChemInform Abstract: LOW TEMPERATURE CHEMICAL VAPOR DEPOSITION OF BORON DOPED SILICON FILMS
HALL, LOU H., KOLIWAD, K. M.Volume:
4
Journal:
Chemischer Informationsdienst
DOI:
10.1002/chin.197351051
Date:
December, 1973
File:
PDF, 90 KB
1973