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Dense Organosilane Monolayer Resist That Directs Highly Selective Atomic Layer Deposition
Hinckley, Adam P., Driskill, Madison M., Muscat, Anthony J.Journal:
ACS Applied Nano Materials
DOI:
10.1021/acsanm.9b02128
Date:
January, 2020
File:
PDF, 5.96 MB
2020