Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2020 / 01 Vol. 38; Iss. 1
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In situ real-time and ex situ spectroscopic analysis of Al 2 O 3 films prepared by plasma enhanced atomic layer deposition
Naumann, Franziska, Reck, Johanna, Gargouri, Hassan, Gruska, Bernd, Blümich, Adrian, Mahmoodinezhad, Ali, Janowitz, Christoph, Henkel, Karsten, Flege, Jan IngoVolume:
38
Language:
english
Journal:
Journal of Vacuum Science & Technology B
DOI:
10.1116/1.5122797
Date:
January, 2020
File:
PDF, 3.22 MB
english, 2020