Thermal etching of AlF 3 and...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2020 / 03 Vol. 38; Iss. 2

Thermal etching of AlF 3 and thermal atomic layer etching of Al 2 O 3

Fischer, Andreas, Routzahn, Aaron, Lee, Younghee, Lill, Thorsten, George, Steven M.
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Volume:
38
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5135911
Date:
March, 2020
File:
PDF, 1.57 MB
2020
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