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Dual-source device architecture for self-diagnosis and correction of gate bias-stress instability in flexible transparent ZnO thin-film transistors
Zhang, Yonghui, Mei, Zengxia, Li, Junqiang, Liang, Huili, Du, XiaolongVolume:
823
Language:
english
Journal:
Journal of Alloys and Compounds
DOI:
10.1016/j.jallcom.2020.153834
Date:
May, 2020
File:
PDF, 2.19 MB
english, 2020