Atomic layer deposition of aluminum oxyfluoride thin films...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2020 / 03 Vol. 38; Iss. 2

Atomic layer deposition of aluminum oxyfluoride thin films with tunable stoichiometry

Mahuli, Neha, Cavanagh, Andrew S., George, Steven M.
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Volume:
38
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5135014
Date:
March, 2020
File:
PDF, 3.37 MB
english, 2020
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