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Investigating the interface characteristics of high-k ZrO 2 /SiO 2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors
Choi, Wan-Ho, Kim, MinJung, Jeon, Woojin, Park, Jin-SeongVolume:
10
Journal:
AIP Advances
DOI:
10.1063/1.5126151
Date:
January, 2020
File:
PDF, 2.97 MB
2020