Etching Kinetics and Surface Conditions for KNbxOy Thin...

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Plasma Chemistry and Plasma Processing 2020 / 1

Etching Kinetics and Surface Conditions for KNbxOy Thin Films with Fluorine- and Chlorine-Based Plasma Chemistries

Lim, Nomin, Efremov, Alexander, Hwang, Hyun-Gyu, Nahm, Sahn, Kwon, Kwang-Ho
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Language:
english
Journal:
Plasma Chemistry and Plasma Processing
DOI:
10.1007/s11090-020-10064-4
Date:
January, 2020
File:
PDF, 1.27 MB
english, 2020
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