Low-temperature plasma enhanced atomic layer deposition of...

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Chinese Physics B 2020 / 01

Low-temperature plasma enhanced atomic layer deposition of large area HfS2 nanocrystal thin films

Chang, Ailing, Mao, Yichen, Huang, Zhiwei, Hong, Haiyang, Xu, Jianfang, Huang, Wei, Chen, Songyan, Li, Cheng
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Language:
english
Journal:
Chinese Physics B
DOI:
10.1088/1674-1056/ab6c4a
Date:
January, 2020
File:
PDF, 1.17 MB
english, 2020
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