TEM investigation of the role of the...

Materials Characterization 2020 / 03 Vol. 161

TEM investigation of the role of the polycrystalline-silicon film/substrate interface in high quality radio frequency silicon substrates

Ding, Lipeng, Raskin, Jean-Pierre, Lumbeeck, Gunnar, Schryvers, Dominique, Idrissi, Hosni
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Volume:
161
Language:
english
Journal:
Materials Characterization
DOI:
10.1016/j.matchar.2020.110174
Date:
March, 2020
File:
PDF, 2.83 MB
english, 2020
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