The effect of pretreatment for SiH 4...

Plasma Processes and Polymers 2020 / 01

The effect of pretreatment for SiH 4 gas by microwave plasma on Si film formation behavior by thermal CVD

Hamanaka, Keiichi, Takei, Norihisa, Kakiuchi, Hiroaki, Yasutake, Kiyoshi, Ohmi, Hiromasa
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Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201900198
Date:
January, 2020
File:
PDF, 1.14 MB
2020
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