ChemInform Abstract: Chemical Vapour Deposition of Alumina from AlCl 3 - H 2 - CO 2 on a Stoichiometric TiC Substrate: A Thermodynamic Approach.
LHERMITTE-SEBIRE, I., COLMET, R., NASLAIN, R., BERNARD, C.Volume:
17
Journal:
Chemischer Informationsdienst
DOI:
10.1002/chin.198631017
Date:
August, 1986
File:
PDF, 115 KB
1986