![](/img/cover-not-exists.png)
Atomic Layer Deposition of Aluminum Phosphate Using AlMe 3 , PO(OMe) 3 and O 2 Plasma: Film Growth and Surface Reactions
Hornsveld, Norah, Kessels, Wilhelmus M.M., Creatore, MariadrianaJournal:
The Journal of Physical Chemistry C
DOI:
10.1021/acs.jpcc.0c00301
Date:
February, 2020
File:
PDF, 1.99 MB
2020