Atomic Layer Deposition of Aluminum Phosphate Using AlMe...

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Atomic Layer Deposition of Aluminum Phosphate Using AlMe 3 , PO(OMe) 3 and O 2 Plasma: Film Growth and Surface Reactions

Hornsveld, Norah, Kessels, Wilhelmus M.M., Creatore, Mariadriana
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Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/acs.jpcc.0c00301
Date:
February, 2020
File:
PDF, 1.99 MB
2020
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