Near-field sub-diffraction photolithography with an elastomeric photomask
Paik, Sangyoon, Kim, Gwangmook, Chang, Sehwan, Lee, Sooun, Jin, Dana, Jeong, Kwang-Yong, Lee, I Sak, Lee, Jekwan, Moon, Hongjae, Lee, Jaejun, Chang, Kiseok, Choi, Su Seok, Moon, Jeongmin, Jung, SoonshVolume:
11
Journal:
Nature Communications
DOI:
10.1038/s41467-020-14439-1
Date:
December, 2020
File:
PDF, 6.95 MB
2020