![](/img/cover-not-exists.png)
[IEEE 2019 IEEE International Integrated Reliability Workshop (IIRW) - South Lake Tahoe, CA, USA (2019.10.13-2019.10.17)] 2019 IEEE International Integrated Reliability Workshop (IIRW) - A Comparative Study of TiN Thickness Scaling Impact on DC and AC NBTI Kinetics in Replacement Metal Gate pMOSFETs
Zhou, Longda, Liu, Qianqian, Ji, Zhigang, Yang, Hong, Xu, Hao, Jiang, Haojie, Luo, Ying, Yin, Huaxiang, Wang, WenwuYear:
2019
DOI:
10.1109/IIRW47491.2019.8989911
File:
PDF, 3.69 MB
2019