Molecular Beam Mass Spectrometry System for...

Plasma Chemistry and Plasma Processing 2004 / 09 Vol. 24; Iss. 3

Molecular Beam Mass Spectrometry System for Characterization of Thermal Plasma Chemical Vapor Deposition

Soonam Park, Feng Liao, John M. Larson, Steven L. Girshick, Michael R. Zachariah
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Volume:
24
Pages:
20
DOI:
10.1007/s11090-004-2273-1
Date:
September, 2004
File:
PDF, 2.15 MB
2004
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