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Evolution of crystallographic structure and ferroelectricity of Hf 0.5 Zr 0.5 O 2 films with different deposition rate
Kim, Taeho, An, Minho, Jeon, SanghunVolume:
10
Journal:
AIP Advances
DOI:
10.1063/1.5121454
Date:
January, 2020
File:
PDF, 4.16 MB
2020