Effect of C2H4/N2Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H)
Christian Sarra-Bournet, Nicolas Gherardi, Hervé Glénat, Gaétan Laroche, Francoise MassinesVolume:
30
Language:
english
Pages:
27
DOI:
10.1007/s11090-010-9214-y
Date:
April, 2010
File:
PDF, 1.10 MB
english, 2010