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Plasma Composition by Mass Spectrometry in a Ar-SiH4-H2LEPECVD Process During nc-Si Deposition
T. Moiseev, D. Chrastina, G. IsellaVolume:
31
Language:
english
Pages:
18
DOI:
10.1007/s11090-010-9277-9
Date:
February, 2011
File:
PDF, 922 KB
english, 2011