A Comparative Study of HBr-Ar and HBr-Cl2Plasma Chemistries...

Plasma Chemistry and Plasma Processing 2011 / 04 Vol. 31; Iss. 2

A Comparative Study of HBr-Ar and HBr-Cl2Plasma Chemistries for Dry Etch Applications

Alexander Efremov, Youngkeun Kim, Hyun-Woo Lee, Kwang-Ho Kwon
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Volume:
31
Language:
english
Pages:
13
DOI:
10.1007/s11090-010-9279-7
Date:
April, 2011
File:
PDF, 429 KB
english, 2011
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