Atmospheric Pressure Plasma Discharge for Polysiloxane Thin...

Plasma Chemistry and Plasma Processing 2011 / 04 Vol. 31; Iss. 2

Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure Process

Riccardo A. Siliprandi, Stefano Zanini, Elisa Grimoldi, Francesco S. Fumagalli, Ruggero Barni, Claudia Riccardi
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Volume:
31
Language:
english
Pages:
20
DOI:
10.1007/s11090-011-9286-3
Date:
April, 2011
File:
PDF, 823 KB
english, 2011
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