Selective pulsed chemical vapor deposition of water-free HfOx on Si in preference to SiCOH and passivated SiO2
Choi, Jong Youn, Ahles, Christopher F., Cho, Yunil, Anurag, Ashay, Wong, Keith T., Nemani, Srinivas D., Yieh, Ellie, Kummel, Andrew C.Volume:
512
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2020.145733
Date:
May, 2020
File:
PDF, 3.77 MB
2020