High Performance Multilayered Organosilicon/Silicon Oxynitride Water Barrier Structure Consecutively Deposited by Plasma-Enhanced Chemical Vapor Deposition at a Low-Temperature
Fu, Ren-Da, Chang, Che Kai, Chuang, Ming-Yueh, Chen, Tai-Hong, Lu, Shao-Kai, Liu, Day-ShanVolume:
10
Language:
english
Journal:
Coatings
DOI:
10.3390/coatings10010011
Date:
December, 2019
File:
PDF, 5.94 MB
english, 2019