[IEEE 2019 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2019.12.7-2019.12.11)] 2019 IEEE International Electron Devices Meeting (IEDM) - 22nm STT-MRAM for Reflow and Automotive Uses with High Yield, Reliability, and Magnetic Immunity and with Performance and Shielding Options
Gallagher, W.J., Lee, George, Shih, Yi-Chun, Lee, Chia-Fu, Lee, Po-Hao, Wang, Roger, Shen, Kuei- Hung, Wu, J. J., Wang, Wayne, Chuang, Harry, Chien, Eric, Chiang, Tien-Wei, Huang, Jian-Cheng, Shih, MeYear:
2019
Language:
english
DOI:
10.1109/IEDM19573.2019.8993469
File:
PDF, 2.24 MB
english, 2019