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Atomic layer deposition of high purity Ga 2 O 3 films using liquid pentamethylcyclopentadienyl gallium and combinations of H 2 O and O 2 plasma
Mizutani, Fumikazu, Higashi, Shintaro, Inoue, Mari, Nabatame, ToshihideVolume:
38
Language:
english
Journal:
Journal of Vacuum Science & Technology A
DOI:
10.1116/1.5134738
Date:
March, 2020
File:
PDF, 1.38 MB
english, 2020