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[IEEE 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2019.4.22-2019.4.25)] 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - New Observation and Analysis of Layout Dependent Effects in Sub-40nm Multi-Ring and Multi-Finger nMOSFETs for High Frequency Applications
Li, Zu-Cheng, Guo, Jyh-Chyurn, Lin, Jinq-MinYear:
2019
Language:
english
DOI:
10.1109/vlsi-tsa.2019.8804636
File:
PDF, 6.34 MB
english, 2019