[IEEE 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2019.4.22-2019.4.25)] 2019 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - New Observation and Analysis of Layout Dependent Effects in Sub-40nm Multi-Ring and Multi-Finger nMOSFETs for High Frequency Applications

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