Resistive switching and synaptic behaviors of an HfO2/Al2O3...

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Journal of Alloys and Compounds 2020 / 2

Resistive switching and synaptic behaviors of an HfO2/Al2O3 stack on ITO for neuromorphic systems

Mahata, Chandreswar, Lee, Changmin, An, Youngseo, Kim, Min-Hwi, Bang, Suhyun, Kim, Chae Soo, Ryu, Ji-Ho, Kim, Sungjun, Kim, Hyoungsub, Park, Byung-Gook
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Journal:
Journal of Alloys and Compounds
DOI:
10.1016/j.jallcom.2020.154434
Date:
February, 2020
File:
PDF, 1.45 MB
2020
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