Deterministic thermal micro-reflow of lithographic...

Microelectronic Engineering 2020 / 03 Vol. 225

Deterministic thermal micro-reflow of lithographic structures for Sub-10-nm metallic gaps fabrication

Wang, Yasi, Liu, Peng, Shi, Huimin, Li, Xin, Chen, Yiqin, Zhang, Shi, Zhang, Chen, Duan, Huigao
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Volume:
225
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2020.111275
Date:
March, 2020
File:
PDF, 2.11 MB
2020
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