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Correction to âFilm Conformality and Extracted Recombination Probabilities of O Atoms during Plasma-Assisted Atomic Layer Deposition of SiO 2 , TiO 2 , Al 2 O 3 and HfO 2 â
Arts, Karsten, Utriainen, Mikko, Puurunen, Riikka L., Kessels, Wilhelmus M. M., Knoops, Harm C. M.Volume:
124
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/acs.jpcc.9b11082
Date:
January, 2020
File:
PDF, 279 KB
2020